Projection objective, projection exposure apparatus and...

Photocopying – Projection printing and copying cameras – Focus or magnification control

Reexamination Certificate

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C355S053000

Reexamination Certificate

active

08064040

ABSTRACT:
A projection objective for microlithography serves for imaging a pattern of a mask arranged in its object surface into an image field arranged in its image surface with a demagnifying imaging scale. It has a multiplicity of optical elements arranged along the optical axis of the projection objective, the optical elements being designed and arranged in such a way that the projection objective has an imageside numerical aperture NA>0.85 and a demagnifying imaging scale where |b|<0.05, and the planar image field having a minimum image field diameter suitable for microlithography of more than 1 mm.

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