Projection objective of a microlithographic projection...

Details Projection objective of a microlithographic projection... Projection objective of a microlithographic projection...

2011-08-02

2011-08-02

Lester, Evelyn A. (Department: 2873)

Optical: systems and elements

Lens

Fluid

C359S666000, C359S667000, C359S648000, C359S649000, C359S650000, C359S651000, C359S708000, C359S798000, C359S799000, C359S800000

Reexamination Certificate

active

07990622

ABSTRACT:
A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled with a liquid. At least one actuator acting exclusively on the lens is furthermore provided, which can generate a rotationally asymmetric deformation of the lens.

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