Optical: systems and elements – Lens – With field curvature shaping
Reexamination Certificate
2005-06-14
2008-12-16
Hasan, Mohammed (Department: 2873)
Optical: systems and elements
Lens
With field curvature shaping
C355S053000
Reexamination Certificate
active
07466489
ABSTRACT:
A projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective suitable for microlithography projection exposure machines has a plurality of optical elements transparent for radiation at an operating wavelength of the projection objective. At least one optical element is a high-index optical element made from a high-index material with a refractive index n≧1.6 at the operating wavelength.
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Beder Susanne
Schuster Karl-Heinz
Singer Wolfgang
Hasan Mohammed
Sughrue & Mion, PLLC
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