Projection objective for microlithography

Optical: systems and elements – Lens – With field curvature shaping

Reexamination Certificate

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C359S756000

Reexamination Certificate

active

07154677

ABSTRACT:
The invention relates to a projection lens comprising a lens assembly that has at least one first narrowing of the group of light beams. A lens with a non-spherical surface is located in front of and/or behind the first narrowing.

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U.S. Appl. No. 09/416,105, filed Oct. 12, 1999, Title: Microlithographic Reduction Objective, Projection Exposure Equipment and Process, 36 pgs.
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