Projection objective for a microlithographic projection...

Details Projection objective for a microlithographic projection... Projection objective for a microlithographic projection...

2005-06-02

2011-11-22

Nguyen, Hung Henry (Department: 2882)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S052000, C355S053000

Reexamination Certificate

active

08064041

ABSTRACT:
A projection objective of a microlithographic projection exposure apparatus contains a plurality of optical elements arranged in N≧2 successive sections A1to ANof the projection objective which are separated from one another by pupil planes or intermediate image planes. According to the invention, in order to correct a wavefront deformation, at least two optical elements each have an optically active surface locally reprocessed aspherically. A first optical element is in this case arranged in one section Aj, j=1 . . . N and a second optical element is arranged in another section Ak, k=1 . . . N, the magnitude difference |k−j| being an odd number.

REFERENCES:
patent: 5117255 (1992-05-01), Shiraishi et al.
patent: 5148314 (1992-09-01), Chen
patent: 5392119 (1995-02-01), McArthur et al.
patent: 5682226 (1997-10-01), Anzai et al.
patent: 5757017 (1998-05-01), Braat
patent: 6157498 (2000-12-01), Takahashi
patent: 6262793 (2001-07-01), Sasaya et al.
patent: 6266389 (2001-07-01), Murayama et al.
patent: 6268903 (2001-07-01), Chiba et al.
patent: 6333776 (2001-12-01), Taniguchi
patent: 6366389 (2002-04-01), Wraback et al.
patent: 6388823 (2002-05-01), Gaber et al.
patent: 6522386 (2003-02-01), Nishi
patent: 6545746 (2003-04-01), Nishi
patent: 6636350 (2003-10-01), Shafer et al.
patent: 2001/0043391 (2001-11-01), Shafer et al.
patent: 2002/0171048 (2002-11-01), Braat
patent: 2002/0171815 (2002-11-01), Matsuyama et al.
patent: 2003/0197922 (2003-10-01), Hudyma
patent: 2004/0169836 (2004-09-01), Wegmann
patent: 2004/0246595 (2004-12-01), Beach
patent: 2007/0019305 (2007-01-01), Ulrich et al.
patent: 0 724 199 (1996-07-01), None
patent: 0 833 180 (1997-09-01), None
patent: 0 824 721 (2000-07-01), None
patent: 1 024 522 (2000-08-01), None
patent: 1 306 698 (2003-05-01), None
patent: 1 318 425 (2003-06-01), None
patent: 1 336 887 (2003-08-01), None
patent: 1 369 608 (2003-12-01), None
patent: 1 630 585 (2006-03-01), None
patent: 10-154657 (1998-06-01), None
patent: 2002-250865 (2002-09-01), None
patent: 2002-258131 (2002-09-01), None
patent: 2005-064310 (2005-03-01), None
patent: WO 01/55767 (2001-08-01), None
patent: WO 02/44786 (2002-06-01), None
patent: 2004/010164 (2004-01-01), None
patent: WO 2004019128 (2004-03-01), None
patent: WO 2004/107011 (2004-12-01), None
patent: WO 2005/121899 (2005-12-01), None
Besenmatter, “Analyse der primären Wirkung asphärischer Flächen mit Hilfe des Delano-Diagramms,” EUMIG, Optik-Entwicklung, A-2351 Wiener Neudorf, Osterreich, (Excerpt), 1978, 7 pages (with English abstract).
Hofmann et al., “Nanometer-Asphären: Wie herstellen and wofüir?”, 1991, 4 pages. (with English abstract).
English translation of Japanese Office Action for corresponding JP Appl No. 2007-526253, dated May 16, 2011.

Affiliated with

Also associated with

Rating

Projection objective for a microlithographic projection... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Projection objective for a microlithographic projection..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Projection objective for a microlithographic projection... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4286796