Projection lens, in particular for microlithography

Details Projection lens, in particular for microlithography Projection lens, in particular for microlithography

2005-03-15

2005-03-15

Epps, Georgia (Department: 2873)

Optical: systems and elements

Lens

Fluid

C355S052000

Reexamination Certificate

active

06867923

ABSTRACT:
A projection lens (3), in particular for microlithography, is provided with an object plane (7), with an image plane (9), with a lens arrangement (4) and with at least one gas chamber filled with gas or through which gas flows. The gas chamber is constructed as an approximately plane-parallel manipulation chamber (13). The refractive index can be varied in the manipulation chamber (13) by pressure changes and/or changes in gas composition.

REFERENCES:
patent: 4676614 (1987-06-01), Ohno
patent: 4676631 (1987-06-01), Kosugi et al.
patent: 4690528 (1987-09-01), Tanimoto et al.
patent: 4699505 (1987-10-01), Komoriya et al.
patent: 4780747 (1988-10-01), Suzuki et al.
patent: 4871237 (1989-10-01), Anzai et al.
patent: 4961001 (1990-10-01), Liegel et al.
patent: 4974018 (1990-11-01), Komoriya et al.
patent: 5025284 (1991-06-01), Komoriya et al.
patent: 5337097 (1994-08-01), Suzuki et al.
patent: 5852490 (1998-12-01), Matsuyama
patent: 5969802 (1999-10-01), Takahashi et al.
patent: 6235438 (2001-05-01), Suzuki et al.
patent: 6333776 (2001-12-01), Taniguchi
patent: 20020033934 (2002-03-01), Ishii
patent: 20030020888 (2003-01-01), Tanaka et al.
patent: 08241861 (1996-09-01), None
patent: 11297620 (1999-10-01), None
International Search Report, 3 pgs., Mar. 18, 2004.

Affiliated with

Also associated with

Rating

Projection lens, in particular for microlithography does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Projection lens, in particular for microlithography, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Projection lens, in particular for microlithography will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3425094