Projection exposure system and method

Details Projection exposure system and method Projection exposure system and method

1997-06-13

1998-12-08

Mathews, A. A.

Photocopying

Projection printing and copying cameras

Illumination systems or details

355 53, G03B 2742, G03B 2772

Patent

active

058478124

ABSTRACT:
Projection exposure systems and methods are disclosed that achieve higher light intensities and reduce the time required for each exposure in multiple exposures of non-linear resists such as a two-photon-absorption resist. Using spatial redistribution of laser light, an illumination optical system forms an illumination region that illuminates only a portion of the pattern on a mask with spatially coherent light from a light source. The system forms the entire mask pattern on a substrate by repeating a non-linear exposure while moving the illumination region and the mask pattern relative to one another. To exploit temporal redistribution of laser light, an illumination optical system employs a pulsed-oscillation-type laser light source to form a mask pattern while varying the light intensity profile on a mask.

REFERENCES:
patent: 5473408 (1995-12-01), Hoffman et al.
patent: 5739898 (1998-04-01), Ozawa et al.

Affiliated with

Also associated with

Rating

Projection exposure system and method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Projection exposure system and method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Projection exposure system and method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-183549