Projection exposure system

Details Projection exposure system Projection exposure system

1989-12-22

1990-11-06

Albritton, C. L.

Electric heating

Metal heating

By arc

21912162, 21912173, B23K 2606

Patent

active

049688685

ABSTRACT:
A projection exposure system is disclosed, which includes: a laser; a mask stage for supporting a photomask; a wafer stage for supporting a wafer; an illumination optical system effective to illuminate the photomask by use of a light from the laser; a projection optical system for projecting, upon the wafer, a circuit pattern formed on the photomask; an adjusting device for adjusting the wavelength to be emitted from the laser; a discharge tube disposed on a path for at least a portion of the light from the laser and being adapted to emit a predetermined line spectrum; a detecting device for detecting a change in a discharged electric current from the discharge tube; and a control device for controlling the adjusting device on the basis of an output signal from the detecting device.

REFERENCES:
patent: 3686585 (1972-08-01), Javen et al.
patent: 3842367 (1974-10-01), Schlossberg
patent: 4156124 (1979-05-01), Macken et al.
patent: 4619508 (1986-10-01), Shibuya et al.
patent: 4703166 (1987-10-01), Bruning
patent: 4734558 (1988-03-01), Nakano et al.
patent: 4773750 (1988-09-01), Bruning
patent: 4785192 (1988-11-01), Bruning
patent: 4786358 (1988-11-01), Yamazaki et al.
patent: 4811055 (1989-03-01), Hirose

Affiliated with

Also associated with

Rating

Projection exposure system does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Projection exposure system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Projection exposure system will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1308307