Radiation imagery chemistry: process – composition – or product th – Including control feature responsive to a test or measurement
Patent
1998-07-24
1999-03-09
Young, Christopher G.
Radiation imagery chemistry: process, composition, or product th
Including control feature responsive to a test or measurement
G03F 900, G03C 500
Patent
active
058798455
ABSTRACT:
A projection exposure apparatus includes a projection optical system for projecting a pattern of a reticle, illuminated with exposure light, onto a substrate to be exposed, an optical characteristic predicting device for predicting, in accordance with an equation including a predetermined correction coefficient, an amount of change in optical characteristic produced in the projection optical system as a result of projection of the pattern, an optical characteristic correcting device for correcting the optical characteristic in accordance with the prediction by the predicting device, an optical characteristic measuring device for measuring the amount of change in optical characteristic, a correction coefficient changing device for changing the correction coefficient in accordance with the measurement by the measuring device, a data storing device for storing the correction coefficient, changed by the changing device, as a data related to the reticle, and a control system operable, when a reticle to be used for the exposure is changed, to cause the predicting device to predict the amount of change in optical characteristic by using a correction coefficient in the data storing device corresponding to the reticle to be used.
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Canon Kabushiki Kaisha
Young Christopher G.
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