Projection exposure method in which mask patterns are imaged on

Details Projection exposure method in which mask patterns are imaged on Projection exposure method in which mask patterns are imaged on

1996-03-13

1999-06-15

Moses, R. L.

Photocopying

Projection printing and copying cameras

Illumination systems or details

355 53, 355 71, G03B 2742, G03B 2754, G03B 2772

Patent

active

059127279

ABSTRACT:
An exposure method of illuminating a pattern on a mask by a light beam from an illuminating optical system and exposing the image of the pattern onto a photosensitive substrate through a projection optical system comprises the steps of discriminating the kind of the mask, setting the state of at least one of the field stop of the illuminating optical system, the aperture stop of the illuminating system and the aperture stop of the projection optical system in conformity with the discriminated kind of the mask, and projecting the image of the pattern on the mask onto a predetermined area of the photosensitive substrate.

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patent: 5286963 (1994-02-01), Torigoe
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