Projection exposure method and apparatus with focus detection

Details Projection exposure method and apparatus with focus detection Projection exposure method and apparatus with focus detection

1993-07-07

1995-05-02

Nelms, David C.

Radiant energy

Photocells; circuits and apparatus

Photocell controls its own optical systems

2502014, G01N 2186

Patent

active

054122147

ABSTRACT:
A projection exposure method and apparatus are disclosed, which can perform a focusing operation with respect to a partly omitted shot exposed at a peripheral portion of a photosensitive substrate such as a wafer. In the projection exposure method and apparatus, when a prohibition band having a predetermined width is set from the edge of the substrate, and exposure is to be performed with respect to a shot area having a portion located only within the prohibition band and the remaining portion located outside the edge of the substrate, a focus detection point is shifted to the boundary line of the prohibition band on the substrate, and a focusing operation is performed. Thereafter, the focus detection point is moved to an original target shot exposure position to perform exposure.

REFERENCES:
patent: 4558949 (1985-12-01), Uehara et al.
patent: 5050111 (1991-09-01), Ayata et al.
patent: 5151750 (1992-09-01), Magome et al.
patent: 5243195 (1973-09-01), Nishi

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