Projection exposure method and apparatus in which scanning expos

Details Projection exposure method and apparatus in which scanning expos Projection exposure method and apparatus in which scanning expos

1996-07-03

1998-08-11

Moses, R. L.

Photocopying

Projection printing and copying cameras

Step and repeat

356399, G03B 2742, G01B 1100

Patent

active

057934711

ABSTRACT:
An exposure method and apparatus usable with a mask stage for holding a mask having an original pattern, a projection optical system for projecting at least a portion of the original pattern at a predetermined magnification and a substrate stage for holding a photosensitive substrate on an imaging plane of the projection optical system. The mask stage and the substrate stage are moved in a timed relation along a scan direction at a speed ratio corresponding to the magnification of the projection optical system by which a projected image of the original pattern can be scanningly printed on shots of the photosensitive layout. Scanning exposure is controlled on the basis of a shot layout of the photosensitive substrate which is determined per chip from information related to a chip structure and a chip size of the original pattern. The original pattern includes a plurality of original chip patterns. Each shot area of the photosensitive substrate has a plurality of printed chip patterns having been formed thereon through an exposure process with a different exposure method or apparatus, separate from the scanning exposure method or apparatus, and the shot layout is determined so that the number of shots with the scanning method or apparatus is fewer.

REFERENCES:
patent: 4488806 (1984-12-01), Takahashi et al.
patent: 4489241 (1984-12-01), Matsuda et al.
patent: 4530587 (1985-07-01), Kosugi et al.
patent: 4792693 (1988-12-01), Yamaguchi et al.
patent: 4924257 (1990-05-01), Jain
patent: 5112133 (1992-05-01), Kurosawa et al.
patent: 5155523 (1992-10-01), Hara et al.
patent: 5182615 (1993-01-01), Kurosawa et al.
patent: 5305222 (1994-04-01), Nakamura
patent: 5331371 (1994-07-01), Mori et al.
patent: 5337247 (1994-08-01), Hamaguchi
patent: 5386269 (1995-01-01), Kosugi
patent: 5448333 (1995-09-01), Iwamoto et al.
patent: 5473410 (1995-12-01), Nishi
patent: 5483056 (1996-01-01), Imai
patent: 5499099 (1996-03-01), Sato et al.
patent: 5534970 (1996-07-01), Nakashima et al.
patent: 5543921 (1996-08-01), Uzawa et al.
patent: 5617182 (1997-04-01), Wakamoto et al.

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