Projection exposure method and an optical mask for use in projec

Details Projection exposure method and an optical mask for use in projec Projection exposure method and an optical mask for use in projec

1994-02-24

1995-05-23

Rosasco, Steve

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430311, 430396, G03F 900

Patent

active

054180937

ABSTRACT:
A projection exposure method includes the steps of (a) irradiating a light from a light source on an optical mask, where the optical mask includes a main space which transmits light and has a desired exposure pattern, and a subspace which transmits light and is provided adjacent to the main space, and (b) exposing a photoresist layer by the light which is transmitted through the optical mask via a lens so as to project an optical image of the main space, where the subspace has a narrow width such that the light transmitted through the subspace by itself does not expose the photosensitive layer.

REFERENCES:
patent: 5130213 (1992-07-01), Berger et al.
Fehrs et al, "Illuminator Modification of an Optical Aligner", Proceeding the KTI Microfabrication Seminar Interface, pp. 217-230, 1989.
T. Ito et al., "Photo-Projection Image Distortion Correction for a 1-.mu.m Pattern Process," Electronics and Communications in Japan, Part 2, vol. 69, No. 3, 1986, New York, N.Y., pp. 30-38.
Patent Abstracts of Japan, vol. 15, No. 268 (P-1224) 8 Jul. 1991 & JP-A-3 089347 (Fujitsu Ltd) 15 Apr. 1991.

Affiliated with

Also associated with

Rating

Projection exposure method and an optical mask for use in projec does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Projection exposure method and an optical mask for use in projec, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Projection exposure method and an optical mask for use in projec will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2139647