Projection exposure method and alignment

Details Projection exposure method and alignment Projection exposure method and alignment

1996-02-23

1998-08-18

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Registration or layout process other than color proofing

430 30, 2504911, G03F 900

Patent

active

057956871

ABSTRACT:
A projection exposure apparatus includes different wavelength alignment systems and exposure wavelength alignment systems for positional adjustment for a mask and a substrate. A fiducial plate with incused diffraction grating marks is used on a substrate stage for alignment. Positional discrepancy amounts between marks on the mask and marks on the fiducial plate are previously determined at various measuring points on the fiducial plate. The discrepancy results from difference in drawing error on the fiducial plate. When a mask having different mark positions is used for overlay exposure, the mask and the substrate undergo positional adjustment in accordance with change in positions of the alignment systems by using the previously determined positional discrepancy amounts.

REFERENCES:
patent: 5138176 (1992-08-01), Nishi
patent: 5521036 (1996-05-01), Iwamoto et al.

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