Projection exposure apparatus with means to vary spherical aberr

Details Projection exposure apparatus with means to vary spherical aberr Projection exposure apparatus with means to vary spherical aberr

1997-06-04

1998-11-03

Moses, R. L.

Photocopying

Projection printing and copying cameras

Step and repeat

355 52, G03B 2742, G03B 2768

Patent

active

058317155

ABSTRACT:
A projection exposure apparatus includes a projection optical system for projecting a pattern of a first object onto a second object; an illuminator for illuminating the pattern of the first object, a wavelength changing device for changing a wavelength of the light from the illuminator; a spherical aberration selector for selecting a spherical aberration of the projection optical system; and a wavelength controller for controlling the wavelength by the wavelength changing device in accordance with the spherical aberration set by the selector.

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Matsumoto, et al., "Issues and Method of Designing Lenses for Optical Lithography," Optical Engineering, vol. 13, No. 12, Dec. 1992, pp. 2657 through 2665.

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