Illumination – Light source and modifier – Plural serial lens elements or components
Reexamination Certificate
2006-07-11
2006-07-11
Ward, John Anthony (Department: 2875)
Illumination
Light source and modifier
Plural serial lens elements or components
C362S277000, C353S069000, C355S052000
Reexamination Certificate
active
07073924
ABSTRACT:
A projection exposure apparatus includes a diaphragm controlling unit controlling one or more of an diaphragm, an iris diaphragm, and a relay lens system. In addition, the projection exposure apparatus also includes a line width calculator which calculates a bias, which is a difference between a line width in a dense part and a line width in an isolated part, based on information regarding a mask pattern, the wavefront aberration of a lens, the effective light source of an illumination optical system, the half-width of a laser, the temperature change in a projection optical system due to exposure, etc. When the bias is out of a tolerance range, the line width calculator calculates a correction value for the diaphragm of the projection optical system or a correction value for the effective light source of the illumination optical system in accordance with the bias which is to be corrected. Then, the diaphragm controlling unit is driven in accordance with the calculation results.
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Japanese Office Action dated Sep. 8, 2004, issued in a corresponding Japanese patent application number 2000-094954, with English translation.
Koizumi Ryo
Takahashi Kazuhiro
Canon Kabushiki Kaisha
Fitzpatrick ,Cella, Harper & Scinto
Negron Ismael
Ward John Anthony
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