Projection exposure apparatus with light distribution adjustment

Radiant energy – Photocells; circuits and apparatus – Photocell controls its own optical systems

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356121, G01J 132

Patent

active

054204178

ABSTRACT:
A projection exposure apparatus provided with an illumination optical system for shaping the illuminating light from a light source into a substantially uniform intensity distribution and irradiating a mask bearing a periodical pattern with the uniform illuminating light, and a projection optical system for forming an image of the mask pattern onto a photosensitive substrate, comprise an optical member for forming plural secondary light source images respectively in discrete positions, eccentric from the optical axis of the illumination optical system or the projection optical system, on a plane in the vicinity of a Fourier transformation plane of the mask pattern or a plane conjugate therewith, in the optical path of the illumination optical system; a light amount varying device for individually regulating the light amounts of the illuminating light emerging from the plural secondary light source images; and a control device for controlling the light amount varying device, according to the direction of local periodicity of the mask pattern.

REFERENCES:
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patent: 4666273 (1987-05-01), Shimizu et al.
patent: 4799791 (1989-01-01), Echizen et al.
patent: 4947413 (1990-08-01), Jewell et al.
patent: 5067811 (1991-11-01), Ouchi
patent: 5184196 (1993-02-01), Nakagawa et al.

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