Projection exposure apparatus with function to measure imaging c

Photocopying – Projection printing and copying cameras – Focus or magnification control

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355 53, 355 67, G03B 2742, G03B 2752, G03B 2754

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active

059147741

ABSTRACT:
In a projection exposure apparatus for projecting an image of a pattern on a reticle through a projection optical system onto a wafer, in order to quickly measure imaging characteristics of the projection optical system without actual exposure, an enlarging optical system consisting of an objective lens and a relay optical system, and an image pickup element are provided on a Z-stage on which the wafer is mounted. Illumination light illuminates an index pattern formed on the reticle to form an image thereof near a first lens in the objective lens through the projection optical system, the enlarging optical system enlarges the thus formed image of the index pattern to form an enlarged image thereof on a receiving surface of the image pickup element, the image pickup element converts it into a signal, and an image processing system processes the signal from the image pickup element, thereby measuring the imaging characteristics of the projection optical system, based on the processing results.

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patent: 5615006 (1997-03-01), Hirukawa et al.
patent: 5635722 (1997-06-01), Wakamoto et al.

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