Projection exposure apparatus including an optical characteristi

Details Projection exposure apparatus including an optical characteristi Projection exposure apparatus including an optical characteristi

1997-09-30

1999-07-20

Le, Que

Radiant energy

Photocells; circuits and apparatus

Photocell controls its own optical systems

250205, G01N 2186

Patent

active

059258870

ABSTRACT:
A projection exposure apparatus including a projection optical system for projecting a pattern of a reticle onto a substrate, an optical characteristic detecting device for detecting a change in optical characteristic of the projection optical system, which change may result from the projection of the reticle pattern onto the substrate through the projection optical system, and a light detecting device for detecting at least one of (i) an intensity distribution of light from the reticle pattern, at a position adjacent to the reticle or adjacent to an imaging plane on which the reticle is to be imaged, and (ii) an intensity distribution of the light from the reticle pattern, at a position adjacent to a pupil plane of the projection optical system, wherein the optical characteristic detecting device is arranged to detect the amount of change in optical characteristic in accordance with the intensity distribution detected by the light detecting device.

REFERENCES:
patent: 4506977 (1985-03-01), Sato et al.
patent: 4666273 (1987-05-01), Shimizu et al.
patent: 4780615 (1988-10-01), Suzuki
patent: 4780616 (1988-10-01), Nishi et al.
patent: 5105075 (1992-04-01), Ohta et al.
patent: 5305054 (1994-04-01), Suzuki et al.
patent: 5331369 (1994-07-01), Terasawa et al.
patent: 5337097 (1994-08-01), Suzuki et al.
patent: 5420417 (1995-05-01), Shiraishi
patent: 5436692 (1995-07-01), Noguchi
Patent Abstracts of Japan, Kokai No. 60-148115, vol. 9, No. 315, Dec. 1985.

Affiliated with

Also associated with

Rating

Projection exposure apparatus including an optical characteristi does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Projection exposure apparatus including an optical characteristi, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Projection exposure apparatus including an optical characteristi will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1323731