Projection exposure apparatus including an illumination optical

Photocopying – Projection printing and copying cameras – Step and repeat

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G03B 2742

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active

061280682

ABSTRACT:
An exposure apparatus for forming an image of a fine pattern having linear features extending in orthogonal first and second directions. The apparatus includes an illumination optical system for illuminating the pattern, the illumination optical system including a device for forming a secondary light source having decreased intensity portions at a center thereof and on first and second axes defined to intersect with each other at the center and defined along the first and second directions, respectively, wherein the secondary light source includes four sections being distributed in four quadrants defined by the center and the first and second axes, a projection optical system for projecting, on an image plane, an image of the pattern illuminated with light from the secondary light source, and a quartered detector, having four detector sections, for detecting a light quantity distribution of the secondary light source. Each of the four detector sections of the quartered detector independently detects a light quantity of a corresponding one of the four sections of the secondary light source.

REFERENCES:
patent: 3729252 (1973-04-01), Nelson
patent: 3776633 (1973-12-01), Frosch et al.
patent: 3887816 (1975-06-01), Colley
patent: 4497015 (1985-01-01), Konno et al.
patent: 4521082 (1985-06-01), Suzuki et al.
patent: 4589769 (1986-05-01), Matsuki
patent: 4619508 (1986-10-01), Shibuya et al.
patent: 4634240 (1987-01-01), Suzuki et al.
patent: 4645924 (1987-02-01), Suzuki et al.
patent: 4780747 (1988-10-01), Suzuki et al.
patent: 4789222 (1988-12-01), Ota et al.
patent: 4924257 (1990-05-01), Jain
patent: 4931830 (1990-06-01), Suwa et al.
patent: 4947030 (1990-08-01), Takahashi
patent: 4970546 (1990-11-01), Suzuki et al.
patent: 4988188 (1991-01-01), Ohta
patent: 5061956 (1991-10-01), Takubo et al.
patent: 5144362 (1992-09-01), Kamon et al.
patent: 5153419 (1992-10-01), Takahashi
patent: 5160962 (1992-11-01), Miura et al.
patent: 5237367 (1993-08-01), Kudo
patent: 5245384 (1993-09-01), Mori
patent: 5251067 (1993-10-01), Kamon
patent: 5253040 (1993-10-01), Kamon et al.
patent: 5264898 (1993-11-01), Kamon et al.
patent: 5286963 (1994-02-01), Torigoe
patent: 5287142 (1994-02-01), Kamon
patent: 5296892 (1994-03-01), Mori
Victor Pol, et al., "Excimer Laser Based Lithography: A Deep-Ultraviolet Wafer Stepper for VLSI Processing", Optical Engineering, vol. 26, No. 4, pp. 311-318, Apr. 1987.
S.T. Yang, et al., "Effect of Central Obscuration on Image Formation in Projection Lithography", SPIE vol. 1264 Optical/Laser Microlithography III, pp. 477-485, 1990.
Hecht & Zajac, Optics, 1st Edition, p. 117, 1974.
Int. Cl., 5th Edition, vol. 7, Section G, pp. 68 and 72, 1989.
E. Glatzel, "New Lenses for Microlithography", SPIE, vol. 237, p. 310, International Lens Design Conference (OSA), 1980.

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