Projection exposure apparatus having function of detecting inten

Details Projection exposure apparatus having function of detecting inten Projection exposure apparatus having function of detecting inten

1996-09-13

1998-08-25

Malley, Daniel P.

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

355 53, 355 55, 355 67, 355 72, 364490, 364491, H01L 2130, G01B 1100

Patent

active

057988382

ABSTRACT:
The invention relates to a projection exposure apparatus for detecting a light-intensity distribution of a spatial image of a mask pattern formed through a projection optical system. The projection exposure apparatus has a knife-edge member which is disposed on the main surface of a wafer stage such that a plane including an exposure surface of a photosensitive substrate is leveled with a light incidence surface of the knife-edge member. The knife-edge member has a transmission area for transmitting the exposure light passing through the projection optical system, a light shielding area for preventing transmission of the exposure light, and a knife-edge defined as a boundary line between the transmission area and the light shielding area. The projection exposure apparatus detects the light-intensity distribution of light from the spatial image while moving the spatial image of the mask pattern and the knife-edge of the knife-edge member relatively to each other. The information related to the light-intensity distribution is used in optically adjusting a projection optical system, or the like.

REFERENCES:
patent: 4780617 (1988-10-01), Umatate et al.
patent: 4871237 (1989-10-01), Anzai et al.
patent: 5189494 (1993-02-01), Muraki
patent: 5483349 (1996-01-01), Suzuki
patent: 5621497 (1997-04-01), Terasawa et al.
patent: 5661548 (1997-08-01), Imai

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