Radiant energy – Photocells; circuits and apparatus – Photocell controls its own optical systems
Patent
1996-04-11
1997-08-05
Westin, Edward P.
Radiant energy
Photocells; circuits and apparatus
Photocell controls its own optical systems
356400, 355 53, G01N 2186, G11B 700, G11B 1103, G03B 2753
Patent
active
056545533
ABSTRACT:
A projection exposure apparatus according to the present invention comprises a projection optical system for projecting a pattern of a mask onto each of exposure areas on a photosensitive substrate, and a mark detection system of off-axis type spaced apart from the projection optical system by a predetermined distance. According to one aspect of the present invention, the projection exposure apparatus includes a calculating means for determining an offset amount of an imaging position of the projection optical system and an offset amount of a best focus position of the mark detection system of off-axis type on the basis of the amount of change of an environmental condition to which the projection optical system and the mark detection system are subjected. The detection of a positioning mark on the substrate is performed after a surface of the substrate at a position of the mark detection system is aligned with the best focus position, in consideration of the offset amounts. According to another aspect of the present invention, the projection exposure apparatus includes an inclination amount measuring means for determining an inclination amount of the surface of the substrate. The detection of the positioning mark on the substrate is performed after the inclination is eliminated or after the surface of the substrate at the position of the mark detection system is aligned with the best focus position in consideration of the inclination amount.
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Kawakubo Masaharu
Okumura Masahiko
Lee John R.
Nikon Corporation
Westin Edward P.
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