Projection exposure apparatus and polarizer

Details Projection exposure apparatus and polarizer Projection exposure apparatus and polarizer

1994-08-26

1995-07-25

Lerner, Martin

Optical: systems and elements

Polarization without modulation

Polarizarion by dichroism

355 71, 359489, G02B 530, G02B 2728, G03B 2772

Patent

active

054367611

ABSTRACT:
A projection exposure apparatus includes a light source, a condenser lens for condensing an illumination light emanating from the light source onto a mask including a circuit pattern, a projection lens for condensing onto a surface of a wafer the illumination light that has passed through the mask, and a polarizer disposed on a surface of a pupil of the projection lens for converting the illumination light converged onto the surface of the wafer into polarized light having radial planes of polarization intersecting the optical axis of the projection lens.

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patent: 5153773 (1992-10-01), Muraki et al.
patent: 5245470 (1993-09-01), Keum

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