Projection exposure apparatus and microdevice manufacturing meth

Details Projection exposure apparatus and microdevice manufacturing meth Projection exposure apparatus and microdevice manufacturing meth

1996-04-10

1999-12-07

Hantis, K. P.

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

G01B 1100

Patent

active

059992700

ABSTRACT:
A projection exposure apparatus includes an illumination optical system for illuminating a first object with exposure light, a projection optical system for projecting a pattern of the first object, illuminated by the exposure light from the illumination optical system, onto a second object, an alignment optical system for illuminating the second object with alignment light, having a wavelength different from the exposure light, and for detecting the alignment light from the second object through the projection optical system, and a moving device for placing the first object on the path of the alignment light when the projection optical system projects the pattern of the first object onto the second object by the exposure light, and for placing the first object out of the path of the alignment light when the alignment optical system detects the alignment light.

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