Projection exposure apparatus and method which uses multiple dif

Details Projection exposure apparatus and method which uses multiple dif Projection exposure apparatus and method which uses multiple dif

1996-05-17

1998-02-03

Moses, R. L.

Photocopying

Projection printing and copying cameras

Step and repeat

355 55, 355 77, H01L 2127, G03F 720

Patent

active

057150397

ABSTRACT:
In exposing and projecting a mask onto a substrate using projection optics, a first grating is provided between the substrate and the projection optics and a second grating is provided between the projection optics and the mask so that the image of the mask pattern is formed near the substrate surface by the interference of beams diffracted by the first grating. This arrangement produces the effect of virtually increasing the NA of the optical system by up to a factor of two, making it possible to manufacture LSIs with fine patterns.

REFERENCES:
patent: 5348837 (1994-09-01), Fukuda et al.
patent: 5446587 (1995-08-01), Kang et al.
patent: 5552856 (1996-09-01), Shiraishi et al.

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