Projection exposure apparatus and method in which mask stage is

Details Projection exposure apparatus and method in which mask stage is Projection exposure apparatus and method in which mask stage is

1998-05-26

1999-11-02

Moses, Richard

Photocopying

Projection printing and copying cameras

Step and repeat

355 55, 355 67, 355 71, 355 77, G03B 2742, G03B 2752, G03B 2754, G03B 2772

Patent

active

059780711

ABSTRACT:
A projection exposure apparatus for positioning, for each shot provided on a wafer, a pattern formed on a mask with respect to the wafer and also for exposing the pattern on the wafer includes a wafer stage carrying the wafer and movable stepwise for each shot, a mask stage carrying the mask and movable, a stage control unit for making relative positioning between the wafer and the pattern of the mask and maintaining the relative positioning so that the stage control unit moves the mask stage to make the relative positioning before the wafer stage stops for each shot, and an exposure control unit for performing exposure while the relative positioning is maintained.

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