Optics: measuring and testing – By alignment in lateral direction – With light detector
Patent
1997-03-25
1998-12-15
Kim, Robert
Optics: measuring and testing
By alignment in lateral direction
With light detector
356363, 356401, G01B 1100, G01B 902
Patent
active
058502912
ABSTRACT:
An exposure method and apparatus for transferring a pattern of a mask onto a substrate to be exposed, with projection through a projection optical system. The apparatus includes a stage being movable while carrying the substrate thereon, a laser interferometer for measuring a position of the stage, wherein a measurement position of a laser beam of the laser interferometer deviates relative to a focal plane of the projection optical system, with respect to a direction of an optical axis of the projection optical system, a memory for memorizing, with respect to each of different positions of the stage, information related to an Abbe error produced in accordance with the deviation of the focal plane and the measurement position of the laser interferometer, and a controller for controlling the stage on the basis of a corrected value corresponding to a measured value of the laser interferometer as corrected by the Abbe error.
REFERENCES:
patent: 5150152 (1992-09-01), Isohata et al.
patent: 5638179 (1997-06-01), Masuyuki
Canon Kabushiki Kaisha
Kim Robert
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