Projection exposure apparatus and method, a semiconductor device

Details Projection exposure apparatus and method, a semiconductor device Projection exposure apparatus and method, a semiconductor device

1992-08-07

1994-02-15

Nelms, David C.

Radiant energy

Photocells; circuits and apparatus

Photocell controls its own optical systems

355 53, G01J 120

Patent

active

052869636

ABSTRACT:
A projection exposure method and apparatus, in which high precision focus detection is assured even when the manner of illumination is changed. The projection exposure apparatus includes an illumination optical system for defining an illumination light source for illuminating an original having a pattern, the illumination optical system including a device for changing the shape of the illumination light source. The apparatus further includes a projection optical system for projecting an image of the pattern, illuminated by the illumination light source, to a surface to be exposed, a focus detecting system for detecting the state of focus of the original and the surface to be exposed, and an adjusting device for adjusting the focus detecting system in accordance with the change of the shape of the illumination light source by the changing device.

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patent: 5153773 (1992-10-01), Muraki et al.
patent: 5160962 (1992-11-01), Miura et al.

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