Photocopying – Projection printing and copying cameras – Illumination systems or details
Reexamination Certificate
2005-04-26
2005-04-26
Mathews, Alan (Department: 2851)
Photocopying
Projection printing and copying cameras
Illumination systems or details
C355S053000, C355S071000, C359S558000
Reexamination Certificate
active
06885433
ABSTRACT:
An exposure apparatus and method to expose an object with an illumination beam irradiated on a mask from a light source disposes an optical unit between the light source and an optical integrator of an illumination optical system to illuminate the mask with an illumination beam, of which an intensity distribution on a Fourier transform plane with respect to a pattern on the mask has an increased intensity portion apart from the optical axis relative to a portion of the intensity distribution on the optical axis.
REFERENCES:
patent: 3492635 (1970-01-01), Farr
patent: 3630598 (1971-12-01), Little, Jr.
patent: 3639039 (1972-02-01), Rhodes, Jr.
patent: 3658420 (1972-04-01), Axelrod
patent: 3729252 (1973-04-01), Nelson
patent: 3770340 (1973-11-01), Cronin et al.
patent: 3776633 (1973-12-01), Frosch et al.
patent: 4132479 (1979-01-01), Dubroeucq et al.
patent: 4179708 (1979-12-01), Sheng et al.
patent: 4207370 (1980-06-01), Liu
patent: 4241389 (1980-12-01), Heimer
patent: 4249793 (1981-02-01), Uehara
patent: 4275288 (1981-06-01), Makosch et al.
patent: 4291938 (1981-09-01), Wagner
patent: 4370026 (1983-01-01), Dubroeucq et al.
patent: 4370034 (1983-01-01), Nohda
patent: 4389701 (1983-06-01), Phillips
patent: 4472023 (1984-09-01), Yamamoto
patent: 4476519 (1984-10-01), Hayamizu
patent: 4497013 (1985-01-01), Ohta
patent: 4497015 (1985-01-01), Konno et al.
patent: 4498742 (1985-02-01), Uehara
patent: 4547037 (1985-10-01), Case
patent: 4566765 (1986-01-01), Miyauchi et al.
patent: 4585315 (1986-04-01), Sincerbox et al.
patent: 4619508 (1986-10-01), Shibuya et al.
patent: 4637691 (1987-01-01), Uehara et al.
patent: 4668077 (1987-05-01), Tanaka
patent: 4739373 (1988-04-01), Nishi et al.
patent: 4749278 (1988-06-01), van der Werf
patent: 4769750 (1988-09-01), Matsumoto et al.
patent: 4778275 (1988-10-01), van den Brink et al.
patent: 4780747 (1988-10-01), Suzuki et al.
patent: 4780749 (1988-10-01), Schulman
patent: 4789222 (1988-12-01), Ota et al.
patent: 4814829 (1989-03-01), Kosugi et al.
patent: 4828392 (1989-05-01), Nomura et al.
patent: 4841341 (1989-06-01), Ogawa et al.
patent: 4851882 (1989-07-01), Takahashi et al.
patent: 4851978 (1989-07-01), Ichihara
patent: 4853756 (1989-08-01), Matsuki
patent: 4854669 (1989-08-01), Birnbach et al.
patent: 4918583 (1990-04-01), Kudo et al.
patent: 4931830 (1990-06-01), Suwa et al.
patent: 4936665 (1990-06-01), Whitney
patent: 4939630 (1990-07-01), Kikuchi et al.
patent: 4947413 (1990-08-01), Jewell et al.
patent: 4952815 (1990-08-01), Nishi
patent: 4970546 (1990-11-01), Suzuki et al.
patent: 4974919 (1990-12-01), Muraki et al.
patent: 4988188 (1991-01-01), Ohta
patent: 4992825 (1991-02-01), Fukuda et al.
patent: 5004348 (1991-04-01), Magome
patent: 5016149 (1991-05-01), Tanaka
patent: 5048926 (1991-09-01), Tanimoto
patent: 5091744 (1992-02-01), Omata
patent: 5098184 (1992-03-01), vanden Brandt et al.
patent: 5121160 (1992-06-01), Sano et al.
patent: 5153419 (1992-10-01), Takahashi
patent: 5153773 (1992-10-01), Muraki et al.
patent: 5191374 (1993-03-01), Hazama et al.
patent: 5208629 (1993-05-01), Matsuo et al.
patent: 5237367 (1993-08-01), Kudo
patent: 5245384 (1993-09-01), Mori
patent: 5264898 (1993-11-01), Kamon et al.
patent: 5286963 (1994-02-01), Torigoe
patent: 5300971 (1994-04-01), Kudo
patent: 5305054 (1994-04-01), Suzuki et al.
patent: 5307207 (1994-04-01), Ichihara
patent: 5309198 (1994-05-01), Nakagawa
patent: RE34634 (1994-06-01), Konno et al.
patent: 5329336 (1994-07-01), Hirano et al.
patent: 5337097 (1994-08-01), Suzuki et al.
patent: 5363170 (1994-11-01), Muraki
patent: 5392094 (1995-02-01), Kudo
patent: 5440426 (1995-08-01), Sandstrom
patent: 5446587 (1995-08-01), Kang et al.
patent: 5463497 (1995-10-01), Muraki et al.
patent: 5638211 (1997-06-01), Shiraishi
patent: 5673102 (1997-09-01), Suzuki et al.
patent: 5719704 (1998-02-01), Shiraishi et al.
patent: 6100961 (2000-08-01), Shiraishi et al.
patent: 6211944 (2001-04-01), Shiraishi
patent: 6233041 (2001-05-01), Shiraishi
patent: 6252647 (2001-06-01), Shiraishi
patent: 6377336 (2002-04-01), Shiraishi et al.
patent: 6392740 (2002-05-01), Shiraishi et al.
patent: 6636293 (2003-10-01), Shiraishi
patent: 6665050 (2003-12-01), Shiraishi
patent: 6704092 (2004-03-01), Shiraishi
patent: 6710854 (2004-03-01), Shiraishi et al.
patent: 6710855 (2004-03-01), Shiraishi
patent: 0 282 593 (1988-09-01), None
patent: 0 346 844 (1989-12-01), None
patent: 0 352 975 (1990-01-01), None
patent: 1137243 (1968-12-01), None
patent: 56-12615 (1981-02-01), None
patent: 58-16214 (1983-01-01), None
patent: 59-49514 (1984-03-01), None
patent: 59-83165 (1984-05-01), None
patent: 61-41150 (1986-02-01), None
patent: 61-91662 (1986-05-01), None
patent: 62-50811 (1987-10-01), None
patent: 1-295215 (1989-11-01), None
patent: 2-50417 (1990-02-01), None
patent: 2-48090 (1990-10-01), None
patent: WO 8808932 (1988-11-01), None
patent: WO 9203842 (1992-03-01), None
“Extended Focal Depth Optical Microlithography”, IBM Technical Disclosure Bulletin, vol. 32, Jun. 1989, pp 125-127.
Delmer L. Fehrs et al., “Illuminator Modification of an Optical Aligner”,KTI Microelectronics Seminar, Nov. 6-7, 1989, pp. 217-230.
David J. Cronin et al., “Dynamic Coherent Optical System”,Optical Engineering, Mar./Apr. 1973, vol. 12, pp. 50-55.
Victor Pol et al., “Excimer laser based lithography: a deep-ultraviolet wafer stepper for VLSI processing”,Optical Engineering, vol. 26, Apr. 1987, pp. 311-318.
D. H. Barry, “Pattern recognition automatic fine alignment”,SPIE, vol. 334, 1982, pp. 10-16.
S. T. Yang et al., “Effect of central obscuration on image formation in projection lithography”,SPIE, vol. 1264, 1990, pp. 477-485.
Naomasa Shiraishi et al., “Optical/Laser Microlithography V”,SPIE- The International Society for Optical Engineerign, vol. 1674, Mar. 11-13, 1992, pp. 741-752.
George O. Reynolds, “A Concept for a High Resolution Optical Lithographic System for Producing One-Half Micron Linewidths”,SPIE, vol. 633, 1986, pp. 228-238.
A. Szegväri, “On the use of an Illumination azimuth diaphragm during coaxial dark field illumination”, Jan. 28, 1923, pp. 1-11.
George Needham, “The Practical Use of The Microscope Including Photomicrography”, 1958, pp. 315-327 and 97.
John Strong, “Concepts of Classical Optics”, 1958, pp. 525-536.
Akira Imai et al., “Lens aberration measurement technique using attenuated phase-shifting mask”, Device Development Center, Hitachi Ltd.
Miyoko Noguchi et al., “Subhalf Micron Lithography System with Phase-Shifting Effect”,SPIE, vol. 1674, 1992, pp. 92-104.
N. Nomura et al., “Heterodyne Holographic Nanometer Alignment for a Wafer Stepper”,Microelectronic Engineering 11, 1990, pp. 133-136.
Emi Tamechika et al., “Investigation of single sideband optical lithography using oblique incidence illumination”, J. Vac. Sci. Technol. B, Nov./Dec. 1992, pp. 3027-3031.
Keiichiro Tounai et al., “Resolution improvement with annular illumination”, VLSI Development Division, NEC Corporation, 1992.
H. Fukuda et al., “Characterization of Super-Resolution Photolithography”,IEEE, 1992, pp. 3.2.1-3.2.4.
Hiroshi Fukuda et al., “A New Pupil Filter for Annular Illumination in Optical Lithography”,Jpn. J. Appl. Phys., vol. 31, 1992, pp 4126-4130.
Maksymilian Pluta, “Principles and Basic Properties”Advanced Light Microscopy, vol. 1, 1988, pp. 460-463.
H. Wolfgang Zieler, “Physical Optical Aspects of Image Formation”,The Optical Performance of the Light Microscope, 1974, pp. 32-55.
James R. Sheats et al., “Optical Lithography Modeling”,Microlithography Science and Technology, Chapters 2-4, 1998, pp. 109-271.
Joseph W. Goodman, “Frequency Analysis of Optical Imaging Systems”,Introduction to Fourier Optics, Chapter 6, 1968, pp. 101-197.
Maksymilian Pluta, “Specialized Methods”,Advanced Light Microscopy, vol. 2, 1989, pp. 100-1
Mathews Alan
Miles & Stockbridge P.C.
Nikon Corporation
LandOfFree
Projection exposure apparatus and method does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Projection exposure apparatus and method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Projection exposure apparatus and method will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3393011