Projection exposure apparatus and method

Details Projection exposure apparatus and method Projection exposure apparatus and method

1995-06-06

1998-05-12

Braun, Fred L.

Photocopying

Projection printing and copying cameras

Step and repeat

356401, G03B 2742, G01B 1126

Patent

active

057514038

ABSTRACT:
In the projection exposure apparatus, the alignment mechanism comprises first and second light-sending systems for sending first and second light beams through a projection optical system to the wafer and sending third and fourth light beams to the reticle, a first scanning system for scanning the first and second light beams along first and second scan straight lines included in the surface of wafer, respectively, and setting the first and second scan straight lines in axis symmetry with respect to a reference straight line passing an intersecting point between the first and second scan lines and an intersecting point between the surface of wafer and the optical axis of projection optical system, a second scanning system for scanning the third and fourth light beams along third and fourth scan straight lines included in the surface of reticle, respectively, and first and second light-receiving systems for detecting reflected light of the first and third light beams emergent from the respective surfaces of wafer and reticle, respectively, and detecting reflected light of the second and fourth light beams emergent from the respective surfaces of wafer and reticle, respectively.

REFERENCES:
patent: 4697087 (1987-09-01), Wu
patent: 4980718 (1990-12-01), Salter et al.
patent: 5004348 (1991-04-01), Magome
patent: 5204535 (1993-04-01), Mizutani
patent: 5464715 (1995-11-01), Nishi et al.
patent: 5489986 (1996-02-01), Magome et al.
patent: 5506684 (1996-04-01), Ota et al.
patent: 5568257 (1996-10-01), Ota et al.
patent: 5583609 (1996-12-01), Mizutani et al.

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