Photocopying – Projection printing and copying cameras – Illumination systems or details
Reexamination Certificate
2005-04-26
2005-04-26
Kim, Peter B. (Department: 2851)
Photocopying
Projection printing and copying cameras
Illumination systems or details
C355S053000, C378S034000
Reexamination Certificate
active
06885432
ABSTRACT:
Disclosed is an exposure apparatus for illuminating a reflection type mask with light from a light source and for exposing a substrate with a pattern of the illuminated reflection type mask, wherein the apparatus includes a projection optical system for projecting the pattern of the reflection type mask onto the substrate, the projection optical system having a stop, wherein the stop has a first opening for defining a numerical aperture of the projection optical system, and a second opening through which light from the reflection type mask passes. This structure effective avoids unwanted physical interference among optical components of an illumination system or the projection optical system even when the size of the whole exposure apparatus is made compact to some degree.
REFERENCES:
patent: 5339346 (1994-08-01), White
patent: 5430781 (1995-07-01), Miyake et al.
patent: 5524039 (1996-06-01), Kamon
patent: 6109756 (2000-08-01), Takahashi
patent: 6172825 (2001-01-01), Takahashi
patent: 6213610 (2001-04-01), Takahashi et al.
patent: 1 039 510 (2000-09-01), None
patent: 7-220997 (1995-08-01), None
patent: 10-70058 (1998-03-01), None
patent: 11-312638 (1999-11-01), None
patent: 2001-100694 (2000-04-01), None
patent: 2000-244168 (2001-09-01), None
Canon Kabushiki Kaisha
Kim Peter B.
Morgan & Finnegan , LLP
LandOfFree
Projection exposure apparatus and device manufacturing method does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Projection exposure apparatus and device manufacturing method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Projection exposure apparatus and device manufacturing method will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3412915