Projection exposure apparatus and device manufacturing method

Details Projection exposure apparatus and device manufacturing method Projection exposure apparatus and device manufacturing method

1995-12-28

2000-01-11

Boudreau, Leo H.

Image analysis

Applications

Manufacturing or product inspection

382255, 353 69, 2502012, 438 7, 438 16, 359754, G03B 2742

Patent

active

060144556

ABSTRACT:
A projection exposure apparatus usable with a reticle having a pattern and a wafer onto which the pattern of the reticle is transferred. The apparatus includes an illumination system for illuminating the reticle, a projection optical system for projecting the pattern of the reticle onto the wafer, wherein the projection optical system includes two lens groups which are individually movable along an optical axis direction, but are not juxtaposed with each other, and a controller for simultaneously adjusting distortion and projection magnification of the pattern projected onto the wafer. The controller performs the adjustment such that the two lens groups of the projection optical system are moved separately along the optical axis direction.

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