Projection exposure apparatus

Details Projection exposure apparatus Projection exposure apparatus

1988-07-01

1989-09-26

Wintercorn, Richard A.

Photocopying

Projection printing and copying cameras

Step and repeat

355 43, 356400, 356349, G03B 2742

Patent

active

048704520

ABSTRACT:
A projection exposure apparatus is provided with an optical member, capable of transmitting the exposure light of a first wavelength, placed between a projection optical system and a wafer. The alignment light of a second wavelength for pattern detection is introduced obliquely to the wafer surface through the optical member. A pattern in the projection exposure area or in the vicinity thereof, particularly an alignment mark can be detected by means of the reflection and transmission characteristics.

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patent: 4650983 (1987-03-01), Suwa
patent: 4668077 (1987-05-01), Tanaka
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patent: 4681430 (1987-07-01), Goel et al.
patent: 4687322 (1987-08-01), Tanimoto et al.
patent: 4704020 (1987-11-01), Murakami et al.
patent: 4710026 (1987-12-01), Magome et al.
patent: 4801977 (1989-01-01), Ishizaka et al.
patent: 4814829 (1989-03-01), Kosugi et al.

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