Optical: systems and elements – Lens – With light limiting or controlling means
Patent
1993-06-01
1994-05-10
Ben, Loha
Optical: systems and elements
Lens
With light limiting or controlling means
359648, 355 52, 355 71, G02B 908, G03B 2768
Patent
active
053113624
ABSTRACT:
A projection exposure apparatus is provided with an illumination optical system for illuminating a reticle having a predetermined pattern and a projection optical system having a predetermined numerical aperture for projecting the predetermined pattern of the reticle illuminated by the illumination optical system onto a wafer surface. The projection optical system is arranged so that, with respect to the focusing of an image of the reticle onto the wafer surface, spherical aberration, which depends on the numerical aperture of the projection optical system, shows a positive tendency corresponding to overcorrection in third-order spherical aberration and a negative tendency corresponding to undercorrection in fifth-order spherical aberration.
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patent: 4891663 (1990-01-01), Hirose
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patent: 4937619 (1990-06-01), Fukuda et al.
patent: 4965630 (1990-10-01), Kato et al.
patent: 5026145 (1991-06-01), Harui et al.
Kameyama Masaomi
Matsumoto Koichi
Tsuchiya Hiroyuki
Ushida Kazuo
Ben Loha
Nguyen Thong
Nikon Corporation
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