Projection exposure apparatus

Radiant energy – Photocells; circuits and apparatus – Photocell controls its own optical systems

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Details

355 53, 353101, G01J 120

Patent

active

051050757

ABSTRACT:
A projection exposure apparatus includes a projection optical system for projecting an image of a pattern of a first object to a second object, and an adjusting system for adjusting projection magnification and distortion of the projected image of the pattern, the adjusting system being operable to displace the first object and a lens element of the projection optical system in a direction of an optical axis of the projection optical system.

REFERENCES:
patent: 4669842 (1987-06-01), Yomoda et al.
patent: 4699505 (1987-10-01), Komoriya et al.
patent: 4725722 (1988-02-01), Maeda et al.
patent: 4786947 (1988-11-01), Kosugi et al.
patent: 4825247 (1989-10-01), Kemi et al.

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