Projection exposure apparatus

Details Projection exposure apparatus Projection exposure apparatus

1994-07-28

1996-02-06

Wintercorn, Richard A.

Photocopying

Projection printing and copying cameras

Identifying, composing, or selecting

355 53, 355 55, G03B 2752, G03B 2770, G03B 2742

Patent

active

054899664

ABSTRACT:
A projection exposure apparatus including a mask stage for supporting a mask, a wafer stage for supporting a wafer, and a projection optical system for projecting, on the wafer, an image of a circuit pattern of the mask, is disclosed. There are provided a surface position detecting system for detecting position of a surface of the wafer with respect to a direction of an optical axis of the projection optical system, an adjusting device for adjusting an interval between the wafer and the projection optical system, to position the wafer surface at a focus position of the projection optical system, and an outputting portion operable to direct a light beam to a reflection surface, provided at a predetermined site on the wafer stage, and to receive reflection light coming from the reflection surface through the projection optical system, the outputting portion producing a signal corresponding to a positional relationship between the reflection surface and the focus position of the projection optical system. A focus position detecting system detects the focus position of the projection optical system, on the basis of the signal from the outputting portion, and a control system controls the adjusting device on the basis of an output of the focus position detecting system and an output of the surface position detecting system.

REFERENCES:
patent: 4395117 (1983-07-01), Suzuki
patent: 4506977 (1985-03-01), Sato et al.
patent: 4629313 (1986-12-01), Tanimoto
patent: 4650983 (1987-03-01), Suwa
patent: 4668077 (1987-05-01), Tanaka
patent: 4705940 (1987-11-01), Kohno
patent: 4780747 (1988-10-01), Suzuki et al.
patent: 4801977 (1989-01-01), Ishizaka et al.
patent: 4814829 (1989-03-01), Kosugi et al.
patent: 4874954 (1989-10-01), Takahashi et al.
patent: 4875076 (1989-10-01), Torigoe et al.
patent: 4952970 (1990-08-01), Suzuki et al.
patent: 4958082 (1990-09-01), Makinouchi et al.
patent: 5101226 (1992-03-01), Beaulieu et al.
patent: 5114223 (1992-05-01), Torigoe et al.
patent: 5117254 (1992-05-01), Kawashima et al.
patent: 5117255 (1992-05-01), Shiraishi et al.
patent: 5148214 (1992-09-01), Ohta et al.
patent: 5150173 (1992-09-01), Isobe et al.
patent: 5160957 (1992-11-01), Ina et al.
patent: 5160962 (1992-11-01), Miura et al.
Mende/Simon, "Physik: Gleichungen und Tabellen," Munich, 1977, pp. 324 and 325.

Affiliated with

Also associated with

Rating

Projection exposure apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Projection exposure apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Projection exposure apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2178296