Optical: systems and elements – Diffraction – From grating
Patent
1992-11-05
1994-05-31
Lerner, Martin
Optical: systems and elements
Diffraction
From grating
355 53, 359615, 359837, G02B 504, G02B 2712, G03B 2742, G03B 2752
Patent
active
053174500
ABSTRACT:
A projection exposure apparatus that provides uniform illumination with at least partially incoherent light that could produce interference fringes. The projection exposure apparatus includes a light source emitting at least partially coherent light, a dispersion element for dispersing the light according to wavelength, a dividing element for dividing the dispersed light into plural light beams, a condenser unit for introducing each of the plural light beams in an overlapping manner onto a mask including circuit patterns, and a projection lens unit for projecting the light passing through the mask onto a surface of a wafer.
REFERENCES:
patent: 3179899 (1965-04-01), Fox
patent: 3435370 (1969-03-01), Harris et al.
patent: 3959740 (1976-05-01), Dewhirst
patent: 4063106 (1977-12-01), Ashkin et al.
patent: 4739373 (1988-04-01), Nishi et al.
patent: 4782368 (1988-11-01), Ogawa et al.
patent: 4922290 (1990-05-01), Yoshitake et al.
patent: 5097291 (1992-03-01), Suzuki
patent: 5144362 (1992-09-01), Kamon et al.
patent: 5191374 (1993-03-01), Hazama et al.
Lerner Martin
Mitsubishi Denki & Kabushiki Kaisha
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