Projection exposure apparatus

Details Projection exposure apparatus Projection exposure apparatus

1981-05-04

1983-01-25

Wintercorn, Richard A.

Photocopying

Projection printing and copying cameras

Step and repeat

355 86, 355 95, G03B 2742

Patent

active

043700543

ABSTRACT:
A projection exposure apparatus in which a mask and a wafer are displaced in a plane perpendicular to the optical axis of the projection optical system to form circuit patterns on the entire surface of the wafer. The mask and wafer are displaced along guides having two guide rails between which are provided means for compensating for non-linearity of one of the guide rails.

REFERENCES:
patent: 3563648 (1971-02-01), Baggaley et al.
patent: 3722996 (1973-03-01), Fox
patent: 3927939 (1975-12-01), Brady et al.

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