Projection exposure apparatus

Details Projection exposure apparatus Projection exposure apparatus

1988-06-24

1990-01-02

Hix, L. T.

Photocopying

Projection printing and copying cameras

Step and repeat

355 71, 355 67, 350 13, 350450, 350475, G03B 2752, G02B 914

Patent

active

048916633

ABSTRACT:
A projection exposure apparatus for projecting, through a refracting optical system, a pattern formed on an original such as a mask or reticle onto a wafer. The projection exposure apparatus includes a light source for providing an excimer laser beam to illuminate the original. The refracting optical system includes a plurality of lenses each of which is made of fused silica (SiO.sub.2) or calcium fluoride (CaF.sub.2).

REFERENCES:
patent: 2983193 (1961-05-01), Schade
patent: 3633985 (1972-01-01), Mouchart
patent: 3779788 (1973-12-01), Keafer, Jr. et al.
patent: 4132479 (1979-01-01), Dubroeucq et al.
patent: 4493555 (1985-01-01), Reynolds
patent: 4773750 (1988-09-01), Bruning
patent: 4785192 (1988-11-01), Bruning
NRL-803 Space Test Program Experiment: Far-Ultraviolet Imaging and Photometry by George R. Carruthers published in SPIE vol. 265, Shuttle Pointing of Electro-Optical Experiments (1981) pp. 280-287.
Optics Letters, "Attainment of the Theoretical Minimum Input Power for Injection Locking of a Unstable-Resonator KrF Laser" by Biglo et al., vol. 6, No. 7, pp. 336-338.
"Coherent Radiation Generation at Short Wavelength VUV and XUV Pulse" article by D. Bradley-Imperial College Applied Optics, Grazing Angle Tuner for CW Lasers by K. German, vol. 20, No. 18, pp. 3168-3170.
Optics Letters, "Injection-Locked, Narrow-Band KrF Discharge Laser Using an Unstable Resonator Cavity", by Goldhar and Murray, vol. 1, No. 6.

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