Projection exposure apparatus

Details Projection exposure apparatus Projection exposure apparatus

1984-10-01

1987-09-01

Haroian, Harry N.

Optics: image projectors

Lens support

Lens position adjustable

353122, G03B 310

Patent

active

046905286

ABSTRACT:
A projection exposure apparatus used to project a minute pattern formed on a photomask or reticle onto a semiconductive wafer has a stabilized image-forming performance. The apparatus comprises a projection lens system including a plurality number of lens elements spaced apart from each other, means for supplying a gas flow to at least one of spaces through which the gas passes, means for isolating the space(s) supplied with gas from atmosphere and means for changing the refractive index of the isolated space(s).

REFERENCES:
patent: 2080120 (1937-05-01), Everett
patent: 3520601 (1970-07-01), Abbott

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