Projection exposure apparatus

Photocopying – Projection printing and copying cameras – Step and repeat

Patent

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Details

355 71, G03B 2742

Patent

active

052871428

ABSTRACT:
A projection exposure apparatus for use in an LSI manufacturing process includes a light source for emitting incoherent light, a polyhedral prism for splitting the incoherent light from the light source into a plurality of rays of light, a condensing system for condensing the plurality of rays of light into overlapping rays illuminating a mask having a circuit pattern, and a projection lens system for condensing the light transmitted through the mask on the surface of a wafer.

REFERENCES:
patent: 5144362 (1992-09-01), Kamon et al.

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