Projection exposure apparatus

Photocopying – Projection printing and copying cameras – Focus or magnification control

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Details

355 30, 355 53, 355 77, G03B 2752

Patent

active

048252476

ABSTRACT:
An exposure apparatus particularly suitable usable for the manufacture of semiconductor microcircuit is disclosed. The apparatus includes a specific arrangement that allows accurate and precise detection of any change in the imaging magnification and/or the image surface position of a projection optical system included in the projection exposure apparatus. Thus, with the present invention, a pattern can be projected upon a workpiece with improved accuracy.

REFERENCES:
patent: 4506977 (1985-03-01), Sato et al.
patent: 4668077 (1987-05-01), Tanaka
patent: 4687322 (1987-08-01), Tanimoto et al.
patent: 4699505 (1987-10-01), Komoriya et al.
patent: 4780747 (1988-10-01), Suzuki et al.

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