Projection exposure apparatus

Details Projection exposure apparatus Projection exposure apparatus

1993-07-14

1994-11-15

Nelms, David C.

Radiant energy

Photocells; circuits and apparatus

Photocell controls its own optical systems

250548, G01N 2186

Patent

active

053650514

ABSTRACT:
A projection exposure apparatus has a structure in which the deviation in a focusing direction between a portion on a wafer which a focus sensor detects during exposure and a desired portion in a shot area is detected, and an offset corresponding to the deviation detected is applied to the focus sensor.

REFERENCES:
patent: 4780617 (1988-10-01), Umatate et al.
patent: 4801208 (1989-01-01), Katoh et al.
patent: 4833621 (1989-05-01), Umatate
patent: 4952815 (1990-08-01), Nishi

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