Projection exposure apparatus

Details Projection exposure apparatus Projection exposure apparatus

1985-04-11

1986-10-07

LaRoche, Eugene R.

Radiant energy

Photocells; circuits and apparatus

Photocell controls its own optical systems

250215, 250237R, 356401, G01J 120, H01J 314, H01J 4014

Patent

active

046161309

ABSTRACT:
A projection exposure apparatus for projecting, onto a semiconductor wafer through a projection lens, an integrated circuit pattern formed on a mask or reticle. An alignment beam having a wavelength different from that for the exposure is used to achieve alignment between the mask and the wafer. A parallel flat plate is detachably disposed between the projection lens and the mask and/or the wafer to prevent a magnification error and/or a focus error of the projection lens which would otherwise be caused upon alignment due to the difference in wavelength.

REFERENCES:
patent: 3897138 (1975-07-01), Kano
patent: 4492459 (1985-01-01), Omata
Jorgensen, R. R. et al, "Mask-to-Wafer Alignment Using Exposure Wavelength", IBM Technical Disclosure Bulletin, vol. 18, No. 2, Jul. 1975, pp. 385-386.

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