Projection exposure apparatus

Details Projection exposure apparatus Projection exposure apparatus

1982-11-09

1985-01-29

Hix, L. T.

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

355 53, 355 77, G03B 2752, G03B 2742, G03B 2732

Patent

active

044962398

ABSTRACT:
Disclosed is an apparatus for exposing a wafer to a projected image of a mask, and including a mask holder for holding the mask, a wafer holder for holding the wafer, a projection optical system for projecting the image of the mask upon the wafer, a guide path extending along a scanning direction, a plurality of sliders sliding on the guide path, a movable member coupling the mask holder and the wafer holder and placed on the sliders, a heater for compensating for the magnification error of the image in a direction orthogonal to the scanning direction attributable to the projection optical system and for producing a temperature distribution in one of the mask and the wafer, and a controller for compensating for the magnification error of the image in the scanning direction and the error of right angle attributable to the guide path and for controlling the posture of the movable member during the movement thereof.

REFERENCES:
patent: 3648470 (1972-03-01), Schulte
patent: 4202623 (1980-03-01), Watkin
patent: 4215934 (1980-08-01), Karasawa et al.
patent: 4226483 (1980-10-01), Yamamoto
patent: 4370054 (1983-01-01), Isohata et al.

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