Projection exposure apparatus

Details Projection exposure apparatus Projection exposure apparatus

1989-08-07

1990-06-05

Hayes, Monroe H.

Photocopying

Projection printing and copying cameras

Illumination systems or details

355 53, G03B 2772

Patent

active

049318306

ABSTRACT:
A projection exposure apparatus is provided with an illuminating optical system for illuminating a reticle having a predetermined fine pattern, a projection optical system for projecting the pattern of the reticle onto a wafer, and diaphragm means so constructed as to vary the aperture of a diaphragm of the projection optical system, wherein means for receiving information on the pattern present on the reticle, and means for determining a diaphgram aperture capable of eliminating the high-order diffracted light generated by the pattern of the reticle according to information as stated above and controlling the aperture of variable diaphragm means of the projection optical system, are provided.

REFERENCES:
patent: 4589769 (1986-05-01), Matsuki
patent: 4780747 (1988-10-01), Suzuki et al.
patent: 4853756 (1989-08-01), Matsuki

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