Projection exposure apparatus

Photocopying – Projection printing and copying cameras – Plural

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Details

356401, 356363, 356375, 250548, G01N 2186, G01B 1100

Patent

active

055836097

ABSTRACT:
A projection exposure apparatus includes an illumination system for illuminating a mask, on which a pattern to be transferred is formed, with exposure light, a projection optical system for imaging and projecting the pattern on the mask onto a photosensitive substrate, beam radiation means for radiating an alignment beam with a wavelength different from the wavelength of the exposure light toward a first grating mark formed on the mask and a transparent portion near the first grating mark, and radiating the alignment beam onto a second grating mark formed on the photosensitive substrate via the transparent portion and the projection optical system, the beam radiation means having a four-beam generation member for generating two first alignment beams which cross each other on the first grating mark, and two second alignment beams which cross each other in a space separated by a predetermined distance from the surface of the mask.

REFERENCES:
patent: 4777374 (1988-10-01), Nakata et al.
patent: 4780617 (1988-10-01), Umatate et al.
patent: 5204535 (1993-04-01), Mizutani
patent: 5214489 (1993-05-01), Mizutani et al.
patent: 5340992 (1994-08-01), Matsugu et al.
patent: 5483348 (1996-01-01), Komatsu et al.
patent: 5489986 (1996-02-01), Magome et al.

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