Optics: measuring and testing – By alignment in lateral direction – With registration indicia
Patent
1991-12-19
1993-02-02
Evans, F. L.
Optics: measuring and testing
By alignment in lateral direction
With registration indicia
250548, 356363, 355 43, 355 53, G01B 1100
Patent
active
051841967
ABSTRACT:
A projection exposure apparatus comprises a projection optical system for forming an image of a predetermined pattern on a mask onto a photosensitive substrate under exposure light having a first wavelength, an illumination system for illuminating a mask on the photosensitive substrate with light having a second wavelength different from the first wavelength through the projection optical system so as to attain alignment, and a detection system for detecting light reflected by the mark. The illumination system comprises a light source for emitting the light having the second wavelength, a first field stop for defining an illumination field on the photosensitive substrate and a second field stop for defining an illumination field on the photosensitive substrate. The first field stop has at least two linear edges which extend in a direction substantially perpendicular to a sagittal direction in a visual field of the projection optical system and are juxtaposed in the sagittal direction at a predetermined interval. The second field stop extends in a direction substantially perpendicular to a meridional direction in a visual field of the projection optical system and has at least two linear edges juxtaposed in the meridional direction at a predetermined interval.
REFERENCES:
patent: 4677301 (1987-06-01), Tanimoto et al.
patent: 4814829 (1989-03-01), Kosugi et al.
patent: 5004348 (1991-04-01), Magome
patent: 5070250 (1991-12-01), Komatsu et al.
Komatsu Kouichirou
Mizutani Hideo
Nakagawa Masahiro
Nojima Yawara
Evans F. L.
Nikon Corporation
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