Projection exposing apparatus and projection exposing method

Details Projection exposing apparatus and projection exposing method Projection exposing apparatus and projection exposing method

1993-10-08

1994-11-22

Wintercorn, Richard A.

Photocopying

Projection printing and copying cameras

Illumination systems or details

355 53, 355 67, G03B 2772, G03B 2742

Patent

active

053673581

ABSTRACT:
A projection exposing apparatus has a second photo-mask disposed on a blind for determining a region to be exposed to deformed light beams, the circuit pattern of the second photo-mask being the same as or arranged to correspond to the circuit pattern of a first photo-mask to be projected onto a substrate The deformed irradiation light beams are applied to the second photo-mask circuit pattern to image diffracted light beams on the substrate and project the circuit pattern.

REFERENCES:
patent: 5144362 (1992-09-01), Kamon et al.
patent: 5160962 (1992-11-01), Miura et al.
patent: 5251067 (1993-10-01), Kamon
patent: 5253040 (1993-10-01), Kamon et al.
patent: 5264898 (1993-11-01), Kamon et al.
patent: 5287142 (1994-02-01), Kamon
patent: 5300967 (1994-04-01), Kamon
patent: 5300971 (1994-04-01), Kudo
patent: 5300972 (1994-04-01), Kamon
patent: 5311249 (1994-05-01), Kamon et al.

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