Projection-exposing apparatus

Details Projection-exposing apparatus Projection-exposing apparatus

1987-12-21

1989-02-21

Wintercorn, Richard A.

Photocopying

Projection printing and copying cameras

Step and repeat

G03B 2742

Patent

active

048069876

ABSTRACT:
A projection-exposing apparatus comprises a projecting optical system for projecting an image of a reticle having a predetermined pattern onto a wafer, and a stage for causing a relative shifting movement between a position of the wafer and a position of the reticle. A first exposure is effected for projecting and exposing the reticle image pattern from the projection optical system in a first area on the wafer and then the stage is shifted by a predetermined amount to effect second exposure for projecting and exposing the reticle image pattern in a second area positioned adjacent to the first area on the wafer thereby the reticle image being projected and exposed onto different areas on the same wafer. The stage causes the relative shifting movement between the reticle and the wafer in such a manner that the reticle image pattern obtained by the first exposure and the reticle image pattern obtained by the second exposure are overlapped with each other on the wafer by a predetermined amount.

REFERENCES:
patent: 4197004 (1980-04-01), Hurlbut
patent: 4397543 (1983-08-01), Kolbe et al.
patent: 4657379 (1987-04-01), Suwa
patent: 4676630 (1987-06-01), Matsushita et al.
patent: 4702592 (1987-10-01), Geiger et al.
B. M. Watrasiewics, Optica Acta, vol. 12, pp. 391-400, 1965.

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